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dc.contributor.authorHATA, SATOSHI
dc.contributor.authorSOSIATI, HARINI
dc.contributor.authorKUWANO, NORIYUKI
dc.contributor.authorITAKURA, MASARU
dc.contributor.authorNAKANO, TAKAYOSHI
dc.contributor.authorUMAKOSHI, YUKICHI
dc.date.accessioned2017-08-10T13:03:44Z
dc.date.available2017-08-10T13:03:44Z
dc.date.issued2006-03-01
dc.identifier.citation12en_US
dc.identifier.other10.1093/jmicro/dfl001
dc.identifier.urihttp://repository.umy.ac.id/handle/123456789/12711
dc.description.abstractA plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.en_US
dc.description.sponsorshipIndustrial Technology Research Program (Project: 03A47002) in 2003 from New Energy and Industrial Technology Development Organization (NEDO) of Japan and Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan.en_US
dc.language.isoenen_US
dc.publisherOXFORD Academicen_US
dc.subjectfocused ion beam, surface damage, plasma cleaner, transmission electron microscopyen_US
dc.subjectResearch Subject Categories::TECHNOLOGYen_US
dc.titleREMOVING FOCUSED ION-BEAM DAMAGES ON TRANSMISSION ELECTRON MICROSCOPY SPECIMENS BY USING A PLASMA CLEANERen_US
dc.typeArticleen_US


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